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| resolution enhancement techniques in optical lithography: Resolution Enhancement Techniques in Optical Lithography Alfred Kwok-Kit Wong, 2001 Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers |
| resolution enhancement techniques in optical lithography: Selected Papers on Resolution Enhancement Techniques in Optical Lithography F. M. Schellenberg, 2004 Optical lithography for integrated circuits is undergoing a renaissance with the adoption of Resolution Enhancement Technology (RET). Some RET concepts have become routine in manufacturing. This volume gathers together seminal RET papers. |
| resolution enhancement techniques in optical lithography: Design and Development of Material-based Resolution Enhancement Techniques for Optical Lithography Xinyu Gu, 2011 The relentless commercial drive for smaller, faster, and cheaper semi-conductor devices has pushed the existing patterning technologies to their limits. Photolithography, one of the crucial processes that determine the feature size in a microchip, is currently facing this challenge. The immaturity of next generation lithography (NGL) technology, particularly EUV, forces the semiconductor industry to explore new processing technologies that can extend the use of the existing lithographic method (i.e. ArF lithography) to enable production beyond the 32 nm node. Two new resolution enhancement techniques, double exposure lithography (DEL) and pitch division lithography (PDL), were proposed that could extend the resolution capability of the current lithography tools. This thesis describes the material and process development for these two techniques. DEL technique requires two exposure passes in a single lithographic cycle. The first exposure is performed with a mask that has a relaxed pitch, and the mask is then shifted by half pitch and re-used for the second exposure. The resolution of the resulting pattern on the wafer is doubled with respect to the features on the mask. This technique can be enabled with a type of material that functions as optical threshold layer (OTL). The key requirements for materials to be useful for OTL are a photoinduced isothermal phase transition and permeance modulation with reverse capabilities. A number of materials were designed and tested based on long alkyl side chain crystalline polymers that bear azobenzene pendant groups on the main chain. The target copolymers were synthesized and fully characterized. A proof-of-concept for the OTL design was successfully demonstrated with a series of customized analytical techniques. PDL technique doubles the line density of a grating mask with only a single exposure and is fully compatible with current lithography tools. Thus, this technique is capable of extending the resolution limit of the current ArF lithography without increasing the cost-of-ownership. Pitch division with a single exposure is accomplished by a dual-tone photoresist. This thesis presents a novel method to enable a dual-tone behavior by addition of a photobase generator (PBG) into a conventional resist formulation. The PBG was optimized to function as an exposure-dependent base quencher, which mainly neutralizes the acid generated in high dose regions but has only a minor influence in low dose regions. The resulting acid concentration profile is a parabola-like function of exposure dose, and only the medium exposure dose produces a sufficient amount of acid to switch the resist solubility. This acid response is exploited to produce pitch division patterns by creating a set of negative-tone lines in the overexposed regions in addition to the conventional positive-tone lines. A number of PBGs were synthesized and characterized, and their decomposition rate constants were studied using various techniques. Simulations were carried out to assess the feasibility of pitch division lithography. It was concluded that pitch division lithography is advantageous when the process aggressiveness factor k1 is below 0.27. Finally, lithography evaluations of these dual-tone resists demonstrated a proof-of-concept for pitch division lithography with 45 nm pitch divided line and space patterns for a k1 of 0.13. |
| resolution enhancement techniques in optical lithography: Resolution Enhancement Techniques in Deep UV Optical Lithography for the 90nm Silicon Technological Node and Below Gianfranco Capetti, 2005 |
| resolution enhancement techniques in optical lithography: Selected Papers on Resolution Enhancement Techniques in Optical Lithography F. M. Schellenberg, 2004-03-30 Optical lithography for integrated circuits is undergoing a renaissance with the adoption of resolution enhancement techniques (RET). Some RET concepts have become routine in manufacturing, almost two decades after the original applications were conceived. This volume gathers together seminal RET papers. Since many of the first applications were announced by Japanese authors well before the material was presented in English, some of the original Japanese papers are included plus their English translations. |
| resolution enhancement techniques in optical lithography: Computational Lithography Xu Ma, Gonzalo R. Arce, 2010-07-15 A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields. |
| resolution enhancement techniques in optical lithography: Optimization of Resolution Enhancement Techniques in Optical Lithography , 2009 As todays' semiconductor fabrication industry tries to keep up with Moore's Law, which predicts the downscaling of integrated circuit size and the doubling of transistor counts every two years, resolution enhancement techniques (RET) play a much more important role than anytime in the past. Optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) are RETs used extensively in the semiconductor industry to improve the resolution and pattern fidelity of optical lithography. Preserving the fidelity of the circuit patterns is important for preserving the performance predicted in the design stage of the integrated circuit (IC). Typical circuit patterns exhibit regular geometries, such as lines, L-joint, U-joint and so on. These regular geometries reduce the resistances between nodes and simplify the process of routing. In the past decades, a variety of OPC, PSM and illumination design approaches have been proposed in the literature. In general, these approaches are divided into two subsets: rule-based and model-based approaches. This dissertation focuses on the study and development of model-based OPC, PSM and illumination optimization approaches for both coherent imaging systems and partially coherent imaging systems. For coherent imaging systems, we develop generalized gradient-based RET optimization methods to solve for the inverse lithography problem, where the search space is not constrained to a finite phase tessellation but where arbitrary search trajectories in the complex space are allowed. Subsequent mask quantization leads to efficient design of PSMs having an arbitrary number of discrete phases. In order to influence the solution patterns to have more desirable manufacturability properties, a wavelet regularization framework is introduced offering more localized flexibility than total-variation regularization methods traditionally employed in inverse problems. The algorithms provide highly effective four-phase PSMs capable of generating mask patterns with arbitrary Manhattan geometries. Furthermore, a double-patterning optimization method for generalized inverse lithography is developed where each patterning uses an optimized two-phase mask. These algorithms are computationally efficient, however, they focused on coherent illumination systems. Most practical illumination sources have a nonzero line width and their radiation is more generally described as partially coherent. Partially coherent illumination (PCI) is desired, since it can improve the theoretical resolution limit. PCI is thus introduced in practice through modified illumination sources having large coherent factors or through off-axis illumination. In partially coherent imaging, the mask is illuminated by light travelling in various directions. The source points giving rise to these incident rays are incoherent with one another, such that there is no interference that could lead to nonuniform light intensity impinging on the mask. The gradient-based inverse lithography optimization methods derived under the coherent illumination assumption fail to account for the nonlinearities of partially coherent illumination and thus perform poorly in the partially coherent scenario. For partially coherent imaging systems with inherent nonlinearities, the sum of coherent systems (SOCS) model and the average coherent approximation model are applied to develop effective and computationally efficient OPC optimization algorithms for inverse lithography. Wavelet regularization is added to the optimization framework to reduce the complexity of the optimized masks. Subsequently, a Singular Value Decomposition (SVD) model is used to develop computationally efficient PSM optimization algorithms for inverse lithography. A novel DCT post-processing is proposed to cut off the high frequency components in the optimized PSMs and keep the fabricating simplicity. Furthermore, a photoresist tone reversing technique is exploited in the design of PSMs to project extremely sparse patterns. As traditional RETs, the above mentioned gradient-based inverse OPC and PSM optimization methods fix the source thus limiting the degrees of freedom during the optimization of the mask patterns. To overcome this restriction, computationally efficient, pixel-based, simultaneous source mask optimization (SMO) methods for both OPC and PSM designs are developed in this dissertation. The synergy is exploited in the joint optimization of source and mask patterns. The resulting source and mask patterns fall well outside the realm of known design forms. In these SMO algorithms, the Fourier series expansion model is applied to approximate the partially coherent system as a sum of coherent systems. Cost sensitivity is used to drive the output pattern error in the descent direction. In order to influence the solution patterns to have more desirable manufacturability properties, topological constraints are added to the optimization framework. Several illustrative simulations are presented to demonstrate the effectiveness of the proposed algorithms. The above gradient-based inverse lithography optimization approaches are effective and computationally efficient under the thin-mask assumption, where the mask is considered as a 2-D object. As the critical dimension (CD) printed on the wafer shrinks into the subwavelength regime, the thick-mask effects become prevalent and thus these effects must be taken into account. Thus, OPC and PSM methods derived under the thin-mask assumption have the inherent limitations and perform poorly in the subwavelength scenario. In order to overcome this limitation, the final contribution of this dissertation focuses on developing OPC and PSM optimization methods based on the boundary layer (BL) model to take into account the thick-mask effects. Attributed to the nonlinear properties of the BL model, model-based forward lithography methods are exploited to obtain the optimized binary and phase-shifting masks. The advantages and limitations of the proposed algorithm are discussed and several illustrative simulations are presented. |
| resolution enhancement techniques in optical lithography: Field Guide to Optical Lithography Chris A. Mack, 2006 This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry. |
| resolution enhancement techniques in optical lithography: Optical and EUV Lithography Andreas Erdmann, 2021-02 |
| resolution enhancement techniques in optical lithography: Fundamental Principles of Optical Lithography Chris Mack, 2008-03-11 The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors. |
| resolution enhancement techniques in optical lithography: Principles of Lithography Harry J. Levinson, 2005 Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus. |
| resolution enhancement techniques in optical lithography: Multiphoton Lithography Jürgen Stampfl, Robert Liska, Aleksandr Ovsianikov, 2016-09-12 This first book on this fascinating, interdisciplinary topic meets the much-felt need for an up-to-date overview of the field. Written with both beginners and professionals in mind, this ready reference begins with an introductory section explaining the basics of the various multi-photon and photochemical processes together with a description of the equipment needed. A team of leading international experts provides the latest research results on such materials as new photoinitiators, hybrid photopolymers, and metallic carbon nanotube composites. They also cover promising applications and prospective trends, including photonic crystals, microfluidic devices, biological scaffolds, metamaterials, waveguides, and functionalized hydrogels. By bringing together the essentials for both industrial and academic researchers, this is an invaluable companion for materials scientists, polymer chemists, surface chemists, surface physicists, biophysicists, and medical scientists working with 3D micro- and nanostructures. |
| resolution enhancement techniques in optical lithography: Optical Lithography Burn Jeng Lin, 2021 This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. This second edition has brand new material on proximity printing, as well as updated and expanded material on: exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies-- |
| resolution enhancement techniques in optical lithography: Nanofabrication Zheng Cui, 2009-01-01 Nanofabrication: Principles, Capabilities and Limits presents a one-stop description at the introductory level on most technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The capabilities of each technology in making sub-100nm structures are described. The limits of preventing a technology from further going down the dimensional scale are analyzed. Drawing upon years of practical experience and using numerous examples, Zheng Cui covers state-of-the art technologies in nanofabrication including: Photon-based lithography Charged particle beams lithography Nanofabrication using scanning probes Nanoscale replication Nanoscale pattern transfer Indirect nanofabrication Nanofabrication by self-assembly Nanofabrication: Principles, Capabilities and Limits will serve as a practical guide and first-hand reference for researchers and practitioners working in nanostructure fabrication and also provides a tool box of various techniques that can be easily adapted in different fields of applications. Written for: Nanoscience and nanotechnology researchers and engineers, technical professionals and academic researchers in the fields of electrtonics, mechanical engineering, and chemical engineering. |
| resolution enhancement techniques in optical lithography: Istc/cstic 2009 (cistc) David Huang, 2009-03 ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference. |
| resolution enhancement techniques in optical lithography: Alternative Lithography Clivia M. Sotomayor Torres, 2012-12-06 Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the devil. In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its Nanotechnology Information Devices (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time. |
| resolution enhancement techniques in optical lithography: Physics of Semiconductor Devices Vikram Kumar, Prasanta Kumar Basu, 2002 |
| resolution enhancement techniques in optical lithography: Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology Luciano Lavagno, Igor L. Markov, Grant Martin, Louis K. Scheffer, 2017-02-03 The second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Second Edition, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology thoroughly examines real-time logic (RTL) to GDSII (a file format used to transfer data of semiconductor physical layout) design flow, analog/mixed signal design, physical verification, and technology computer-aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more. New to This Edition: Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non-recurring engineering (NRE) costs Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography New coverage of cutting-edge applications and approaches realized in the decade since publication of the previous edition—these are illustrated by new chapters on 3D circuit integration and clock design Offering improved depth and modernity, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology provides a valuable, state-of-the-art reference for electronic design automation (EDA) students, researchers, and professionals. |
| resolution enhancement techniques in optical lithography: Laser Beam Shaping Applications Fred M. Dickey, Todd E. Lizotte, Scott C. Holswade, David L. Shealy, 2018-10-03 The practice of shaping the irradiance profile of laser beams goes back more than three decades, and the applications of beam shaping are as diverse as they are numerous. However, until Dickey and Holswade's groundbreaking and highly popular Laser Beam Shaping: Theory and Techniques was published, there was no single, detailed treatment available on the underlying theory and basic techniques of beam shaping. Building on the foundations of this previous work, these esteemed editors have teamed with recognized expert David L. Shealy to produce the first in-depth account of beam shaping applications and design. Laser Beam Shaping Applications details the important features of beam shaping and exposes the subtleties of the theory and techniques that are best demonstrated through proven applications. In chapters contributed by prominent, active leaders in their respective specialties, the book discusses applications in lithography, laser printing, optical data storage, stable isotope separation, adaptive mirrors, and spatially dispersive lasers. The contributors share major insights, knowledge, and experience, reveal the advantages of the technologies, and include extensive references to the literature. The book concludes with a summary of beam shaping theory and techniques as well as the history of the field. Providing practical expertise, Laser Beam Shaping Applications is an extremely helpful guide to improving current laser processes, optimizing application-specific technologies, and advancing future development in the field. |
| resolution enhancement techniques in optical lithography: Handbook of Semiconductor Manufacturing Technology Yoshio Nishi, Robert Doering, 2017-12-19 Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand. |
| resolution enhancement techniques in optical lithography: Micro/Nanolithography Jagannathan Thirumalai, 2018-05-02 The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe. |
| resolution enhancement techniques in optical lithography: Plasma Processing of Nanomaterials R. Mohan Sankaran, 2017-12-19 We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis. |
| resolution enhancement techniques in optical lithography: China Semiconductor Technology International Conference 2010 (CSTIC 2010) Han-Ming Wu, 2010-03 Our mission is to provide a forum for world experts to discuss technologies, address the growing needs associated with silicon technology, and exchange their discoveries and solutions for current issues of high interest. We encourage collaboration, open discussion, and critical reviews at this conference. Furthermore, we hope that this conference will also provide collaborative opportunities for those who are interested in the semiconductor industry in Asia, particularly in China. |
| resolution enhancement techniques in optical lithography: CMOS Past, Present and Future Henry Radamson, Eddy Simoen, Jun Luo, Chao Zhao, 2018-04-03 CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements. - Addresses challenges and opportunities for the use of CMOS - Covers the latest methods of strain engineering, materials integration to increase mobility, nano-scaled transistor processing, and integration of CMOS with photonic components - Provides a look at the evolution of CMOS technology, including the origins of the technology, current status and future possibilities |
| resolution enhancement techniques in optical lithography: Extending Moore's Law through Advanced Semiconductor Design and Processing Techniques Wynand Lambrechts, Saurabh Sinha, Jassem Ahmed Abdallah, Jaco Prinsloo, 2018-09-13 This book provides a methodological understanding of the theoretical and technical limitations to the longevity of Moore’s law. The book presents research on factors that have significant impact on the future of Moore’s law and those factors believed to sustain the trend of the last five decades. Research findings show that boundaries of Moore’s law primarily include physical restrictions of scaling electronic components to levels beyond that of ordinary manufacturing principles and approaching the bounds of physics. The research presented in this book provides essential background and knowledge to grasp the following principles: Traditional and modern photolithography, the primary limiting factor of Moore’s law Innovations in semiconductor manufacturing that makes current generation CMOS processing possible Multi-disciplinary technologies that could drive Moore's law forward significantly Design principles for microelectronic circuits and components that take advantage of technology miniaturization The semiconductor industry economic market trends and technical driving factors The complexity and cost associated with technology scaling have compelled researchers in the disciplines of engineering and physics to optimize previous generation nodes to improve system-on-chip performance. This is especially relevant to participate in the increased attractiveness of the Internet of Things (IoT). This book additionally provides scholarly and practical examples of principles in microelectronic circuit design and layout to mitigate technology limits of previous generation nodes. Readers are encouraged to intellectually apply the knowledge derived from this book to further research and innovation in prolonging Moore’s law and associated principles. |
| resolution enhancement techniques in optical lithography: Microoptics and Nanooptics Fabrication Shanalyn Kemme, 2018-09-03 The deep interconnection between micro/nanooptical components and related fabrication technologies—and the constant changes in this ever-evolving field—means that successful design depends on the engineer’s ability to accommodate cutting-edge theoretical developments in fabrication techniques and experimental realization. Documenting the state of the art in fabrication processes, Microoptics and Nanooptics Fabrication provides an up-to-date synopsis of recent breakthroughs in micro- and nanooptics that improve key developmental processes. This text elucidates the precise and miniaturized scale of today’s fabrication methods and their importance in creating new optical components to access the spectrum of physical optics. It details successful fabrication techniques and their direct effect on the intended performance of micro- and nanooptical components. The contributors explore the constraints related to material selection, component lateral extent, minimum feature size, and other issues that cause fabrication techniques to lag behind corresponding theory in the development process. Written with the professional optical engineer in mind, this book omits the already well-published broader processing fundamentals. Instead it focuses on key tricks of the trade helpful in reformulating processes to achieve necessary optical targets, improve process fidelity, and reduce production costs. The contributing authors represent the vanguard in micro-optical fabrication. The result of their combined efforts, this searing analysis of emerging fabrication technologies will continue to fuel the expansion of optics components, from the microwave to the infrared through the visible regime. |
| resolution enhancement techniques in optical lithography: Handbook of Integrated Circuit Industry Yangyuan Wang, Min-Hwa Chi, Jesse Jen-Chung Lou, Chun-Zhang Chen, 2023-11-27 Written by hundreds experts who have made contributions to both enterprise and academics research, these excellent reference books provide all necessary knowledge of the whole industrial chain of integrated circuits, and cover topics related to the technology evolution trends, fabrication, applications, new materials, equipment, economy, investment, and industrial developments of integrated circuits. Especially, the coverage is broad in scope and deep enough for all kind of readers being interested in integrated circuit industry. Remarkable data collection, update marketing evaluation, enough working knowledge of integrated circuit fabrication, clear and accessible category of integrated circuit products, and good equipment insight explanation, etc. can make general readers build up a clear overview about the whole integrated circuit industry. This encyclopedia is designed as a reference book for scientists and engineers actively involved in integrated circuit research and development field. In addition, this book provides enough guide lines and knowledges to benefit enterprisers being interested in integrated circuit industry. |
| resolution enhancement techniques in optical lithography: Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes Bernd O. Kolbesen, 2003 ... ALTECH 2003 was Symposium J1 held at the 203rd Meeting of the Electrochemical Society in Paris, France from April 27 to May 2, 2003 ... Symposium M1, Diagnostic Techniques for Semiconductor Materials and Devices, was part of the 202nd Meeting of the Electrochemical Society held in Salt Lake City, Utah, from October 21 to 25, 2002 ...--p. iii. |
| resolution enhancement techniques in optical lithography: Computational Lithography Xu Ma, Gonzalo R. Arce, 2011-01-06 A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields. |
| resolution enhancement techniques in optical lithography: Handbook of Optical Systems, Volume 2 Wolfgang Singer, Michael Totzeck, Herbert Gross, 2006-05-12 The state-of-the-art full-colored handbook gives a comprehensive introduction to the principles and the practice of calculation, layout, and understanding of optical systems and lens design. Written by reputed industrial experts in the field, this text introduces the user to the basic properties of optical systems, aberration theory, classification and characterization of systems, advanced simulation models, measuring of system quality and manufacturing issues. In this Volume Volume 2 continues the introduction given in volume 1 with the more advanced texts about the foundations of image formation. Emphasis is placed on an intuitive while theoretically exact presentation. More than 400 color graphs and selected references on the end of each chapter support this undertaking. From the contents: 17 Wave equation 18 Diffraction 19 Interference and coherence 20 Imaging 21 Imaging with partial coherence 22 Three dimensional imaging 23 Polarization 24 Polarization and optical imaging A1 Mathematical appendix Other Volumes Volume 1: Fundamentals of Technical Optics Volume 3: Aberration Theory and Correction of Optical Systems Volume 4: Survey of Optical Instruments Volume 5: Advanced Physical Optics |
| resolution enhancement techniques in optical lithography: Industrial Applications Of Ultrafast Lasers Richard A Haight, Adra Carr, 2018-03-16 This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs. The most up-to-date ultrafast laser technologies are described and methods to generate high harmonics for photoelectron spectroscopy of industrially important materials are covered, with an emphasis on practical laboratory implementation. Basic device physics merged with photoemission studies from single- and polycrystalline materials are described. Extensions to new methods for extracting key device properties of metal-oxide-semiconductor structures, including band offsets, effective work functions, semiconductor band bending and defect-related charging in a number of technologically important gate oxides are detailed. Polycrystalline photovoltaic materials and heterostructures as well as organic light emitting materials are covered. This book describes both the history, and most recent applications of ultrafast laser science to industrially relevant materials, processes and devices. |
| resolution enhancement techniques in optical lithography: Nanoelectronics Joachim Knoch, 2020-12-07 The author presents all aspects, in theory and experiments, of nanoelectronic devices starting from field-effect transistors and leading to alternative device concepts such as Schottky-barrier MOSFETs and band-to-band tunnel FETs. Latest advances in Nanoelectronics, as ultralow power nanoscale devices and the realization of silicon MOS spin qubits, are discussed and finally a brief introduction into device simulations is given as well. |
| resolution enhancement techniques in optical lithography: Comprehensive Nanoscience and Nanotechnology , 2019-01-02 Comprehensive Nanoscience and Technology, Second Edition, Five Volume Set allows researchers to navigate a very diverse, interdisciplinary and rapidly-changing field with up-to-date, comprehensive and authoritative coverage of every aspect of modern nanoscience and nanotechnology. Presents new chapters on the latest developments in the field Covers topics not discussed to this degree of detail in other works, such as biological devices and applications of nanotechnology Compiled and written by top international authorities in the field |
| resolution enhancement techniques in optical lithography: High-Performance Computing and Networking Peter Sloot, Marian Bubak, Alfons Hoekstra, Bob Hertzberger, 1999-03-30 This book constitutes the refereed proceedings of the 7th International Conference on High-Performance Computing and Networking, HPCN Europe 1999, held in Amsterdam, The Netherlands in April 1999. The 115 revised full papers presented were carefully selected from a total of close to 200 conference submissions as well as from submissions for various topical workshops. Also included are 40 selected poster presentations. The conference papers are organized in three tracks: end-user applications of HPCN, computational science, and computer science; additionally there are six sections corresponding to topical workshops. |
| resolution enhancement techniques in optical lithography: Nanolithography M Feldman, 2014-02-13 Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, What comes next? and How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics |
| resolution enhancement techniques in optical lithography: Optical Microlithography , 2001 |
| resolution enhancement techniques in optical lithography: Advanced Processes for 193-nm Immersion Lithography Yayi Wei, Robert L. Brainard, 2009 This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning. |
| resolution enhancement techniques in optical lithography: Nanotechnology Lifeng Chi, 2010-08-09 This front line reference investigates nanostructured surfaces, invisible to the naked eye. Machinery and processes explained in a logical fashion. Students and professionals will benefit from the knowledge imparted by the prominent authors. |
| resolution enhancement techniques in optical lithography: International Trends in Applied Optics Arthur Henry Guenther, 2002 This is the fifth in a series initiated in 1989 by the International Commission for Optics (ICO). These books, which are published every three years, highlight the advances in optics that are underway at the time of their publication. These are a collection of significant contributions from leading scientists and engineers throughout the world. It shows the diverse role optics play in modern society, with optics now taking its place along with mechanical, thermal, electrical and electronic options, in order to bring solutions. The world is coming to recognize the ubiquitous nature of optics and its primarily enabling role in our everyday world. |
| resolution enhancement techniques in optical lithography: Nanometer CMOS Juin J. Liou, Frank Schwierz, Hei Wong, 2010-02-28 This book presents the material necessary for understanding the physics, operation, design, and performance of modern MOSFETs with nanometer dimensions. It offers a brief introduction to the field and a thorough overview of MOSFET physics, detailing the relevant basics. The authors apply presented models to calculate and demonstrate transistor characteristics, and they include required input data (e.g., dimensions, doping) enabling readers to repeat the calculations and compare their results. The book introduces conventional and novel advanced MOSFET concepts, such as multiple-gate structures or alternative channel materials. Other topics covered include high-k dielectrics and mobility enhancement techniques, MOSFETs for RF (radio frequency) applications, MOSFET fabrication technology. |
英語「resolution」の意味・使い方・読み方 | Weblio英和辞書
resolution【名】決意,決心 (したこと),決断 (力),不屈,決議 (案),分解... good resolutions:行ないを改めようという決心. - 研究社 新英和中辞典...【発音】rèzəlúːʃən, ˌrezʌˈlu:ʃʌn【変化】resolutions (複 …
「解像度」の英語・英語例文・英語表現 - Weblio和英辞書
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Resolutionsの意味・使い方・読み方 | Weblio英和辞書
「Resolutions」の意味・翻訳・日本語 - resolutionの複数形。 決意、 決心 (したこと)｜Weblio英和・和英辞書
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英語「query」の意味・使い方・読み方 | Weblio英和辞書
a 〔+ 目的語 +about+ (代) 名詞 〕〈…に〉〔…の ことで 〕 質問する. They queried the prime minister about his resolution. 彼らは 総理大臣 に 決意 の 程 を 尋 ねた.
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「分解」の英語・英語例文・英語表現 - Weblio和英辞書
数学の ホモロジー 代数 において，分解（ぶんかい， 英: resolution）（あるいは 左 分解 (left resolution); 双対 の 余分 解 (coresolution) あるいは 右 分解 (right resolution)）は 加群 （あるいは …
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英語「conflict」の意味・使い方・読み方 | Weblio英和辞書
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英語「resolution」の意味・使い方・読み方 | Weblio英和辞書
resolution【名】決意,決心 (したこと),決断 (力),不屈,決議 (案),分解... good resolutions:行ないを改めようという決心. - 研究社 新英和中辞典...【発音】rèzəlúːʃən, ˌrezʌˈlu:ʃʌn【変化 …
「解像度」の英語・英語例文・英語表現 - Weblio和英辞書
「解像度」は英語でどう表現する？【対訳】resolution, degree of understanding, how well one understands a person or thing... - 1000万語以上収録！ 英訳・英文・英単語の使い分けな …
Resolutionsの意味・使い方・読み方 | Weblio英和辞書
「Resolutions」の意味・翻訳・日本語 - resolutionの複数形。 決意、 決心 (したこと)｜Weblio英和・和英辞書
「分解能」の英語・英語例文・英語表現 - Weblio和英辞書
「分解能」は英語でどう表現する？【対訳】resolution, resolving power... - 1000万語以上収録！ 英訳・英文・英単語の使い分けならWeblio英和・和英辞書
written resolutionの意味・使い方・読み方 | Weblio英和辞書
「written resolution」の意味・翻訳・日本語 - 書面決議；決議書｜Weblio英和・和英辞書
英語「query」の意味・使い方・読み方 | Weblio英和辞書
a 〔+ 目的語 +about+ (代) 名詞 〕〈…に〉〔…の ことで 〕 質問する. They queried the prime minister about his resolution. 彼らは 総理大臣 に 決意 の 程 を 尋 ねた.
spatial resolutionの意味・使い方・読み方 | Weblio英和辞書
spatial resolutionの意味や使い方 空間的分解能; 空間分解能; 空間分解; 空間的解像度 - 約489万語ある英和辞典・和英辞典。 発音・イディオムも分かる英語辞書。
「分解」の英語・英語例文・英語表現 - Weblio和英辞書
数学の ホモロジー 代数 において，分解（ぶんかい， 英: resolution）（あるいは 左 分解 (left resolution); 双対 の 余分 解 (coresolution) あるいは 右 分解 (right resolution)）は 加群 （ある …
英語「board」の意味・使い方・読み方 | Weblio英和辞書
board【名】板,黒板,掲示板, (遊戯の)盤,台板,パンこね台... a board fence:板塀. - 研究社 新英和中辞典...【発音】bˈɔɚd, bˈɔːd【変化】boarding (現在分詞),boarded (過去形),boarded (過去分 …
英語「conflict」の意味・使い方・読み方 | Weblio英和辞書
「conflict」の意味・翻訳・日本語 - (武力による、比較的長期にわたる)戦い、争い、闘争、戦闘、 (主義・主張上の)争い、争議、論争、口論、 (思想・利害などの)衝突｜Weblio英和・和英 …
