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| principles of plasma discharges and materials processing: Principles of Plasma Discharges and Materials Processing Michael A. Lieberman, Alan J. Lichtenberg, 2005-04-08 A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever. |
| principles of plasma discharges and materials processing: Principles of Plasma Discharges and Materials Processing Michael A. Lieberman, Allan J. Lichtenberg, 2024-10-15 A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field. |
| principles of plasma discharges and materials processing: Principles of Plasma Discharges and Materials Processing , 1994 |
| principles of plasma discharges and materials processing: Lecture Notes on Principles of Plasma Processing Francis F. Chen, Jane P. Chang, 2012-12-06 Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry. |
| principles of plasma discharges and materials processing: Principles of Plasma Physics Nicholas A. Krall, Alvin W. Trivelpiece, 1973 |
| principles of plasma discharges and materials processing: Lecture Notes on Principles of Plasma Processing Francis F. Chen, Jane P. Chang, 2003-01-31 Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry. |
| principles of plasma discharges and materials processing: Physics of Radio-Frequency Plasmas Pascal Chabert, Nicholas Braithwaite, 2011-02-24 Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations. |
| principles of plasma discharges and materials processing: Principles of Plasma Physics for Engineers and Scientists Umran S. Inan, Marek Gołkowski, 2010-12-02 This unified introduction provides the tools and techniques needed to analyze plasmas and connects plasma phenomena to other fields of study. Combining mathematical rigor with qualitative explanations, and linking theory to practice with example problems, this is a perfect textbook for senior undergraduate and graduate students taking one-semester introductory plasma physics courses. For the first time, material is presented in the context of unifying principles, illustrated using organizational charts, and structured in a successive progression from single particle motion, to kinetic theory and average values, through to collective phenomena of waves in plasma. This provides students with a stronger understanding of the topics covered, their interconnections, and when different types of plasma models are applicable. Furthermore, mathematical derivations are rigorous, yet concise, so physical understanding is not lost in lengthy mathematical treatments. Worked examples illustrate practical applications of theory and students can test their new knowledge with 90 end-of-chapter problems. |
| principles of plasma discharges and materials processing: Introduction to Plasma Dynamics A. I. Morozov, 2012-12-06 As the twenty-first century progresses, plasma technology will play an increasing role in our lives, providing new sources of energy, ion-plasma processing of materials, wave electromagnetic radiation sources, space plasma thrusters, and more. Studies of the plasma state of matter not only accelerate technological developments but also improve the |
| principles of plasma discharges and materials processing: Cold Plasma in Materials Fabrication Alfred Grill, 1994 Cold plasma research and development activities, as well as its applications in materials processing have grown enormously in the past decade. Cold Plasma in Materials Fabrication is a comprehensive, up-to-date monograph which presents all aspects of cold, low-pressure plasmas. The eight extensive chapters in this book cover the following topics: . The main parameters and classifications of different types of plasma. Reactions within cold plasmas and between cold plasmas and solid surfaces. State-of-the-art methods for generation and diagnostics of cold plasmas and their application for processing of materials This invaluable reference tool provides a helpful bibliography with suggestions for further reading on each subject. The book will be of importance to manufacturing engineers and scientists, as well as advanced students in engineering, materials, physics, and chemistry programs. |
| principles of plasma discharges and materials processing: Introduction to Plasma Theory Dwight Roy Nicholson, 1983 Provides a complete introduction to plasma physics as taught in a 1-year graduate course. Covers all important topics of plasma theory, omitting no mathematical steps in derivations. Covers solitons, parametric instabilities, weak turbulence theory, and more. Includes exercises and problems which apply theories to practical examples. 4 of the 10 chapters do not include complex variables and can be used for a 1-semester senior level undergraduate course. |
| principles of plasma discharges and materials processing: Ideal MHD Jeffrey P. Freidberg, 2014-06-26 Comprehensive, self-contained, and clearly written, this successor to Ideal Magnetohydrodynamics (1987) describes the macroscopic equilibrium and stability of high temperature plasmas - the basic fuel for the development of fusion power. Now fully updated, this book discusses the underlying physical assumptions for three basic MHD models: ideal, kinetic, and double-adiabatic MHD. Included are detailed analyses of MHD equilibrium and stability, with a particular focus on three key configurations at the cutting-edge of fusion research: the tokamak, stellarator, and reversed field pinch. Other new topics include continuum damping, MHD stability comparison theorems, neoclassical transport in stellarators, and how quasi-omnigeneity, quasi-symmetry, and quasi-isodynamic constraints impact the design of optimized stellarators. Including full derivations of almost every important result, in-depth physical explanations throughout, and a large number of problem sets to help master the material, this is an exceptional resource for graduate students and researchers in plasma and fusion physics. |
| principles of plasma discharges and materials processing: Principles of Vapor Deposition of Thin Films Professor K.S. K.S Sree Harsha, 2005-12-16 The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text. |
| principles of plasma discharges and materials processing: Atomic Layer Processing Thorsten Lill, 2021-06-28 Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject. |
| principles of plasma discharges and materials processing: Plasma Technology for Hyperfunctional Surfaces Hubert Rauscher, Massimo Perucca, Guy Buyle, 2010-04-16 Based on a project backed by the European Union, this is a must-have resource for researchers in industry and academia concerned with application-oriented plasma technology research. Clearly divided in three sections, the first part is dedicated to the fundamentals of plasma and offers information about scientific and theoretical plasma topics, plasma production, surface treatment process and characterization. The second section focuses on technological aspects and plasma process applications in textile, food packaging and biomedical sectors, while the final part is devoted to concerns about the environmental sustainability of plasma processes. |
| principles of plasma discharges and materials processing: Purification of Laboratory Chemicals W.L.F. Armarego, 2003-03-07 Now in its fifth edition, the book has been updated to include more detailed descriptions of new or more commonly used techniques since the last edition as well as remove those that are no longer used, procedures which have been developed recently, ionization constants (pKa values) and also more detail about the trivial names of compounds.In addition to having two general chapters on purification procedures, this book provides details of the physical properties and purification procedures, taken from literature, of a very extensive number of organic, inorganic and biochemical compounds which are commercially available. This is the only complete source that covers the purification of laboratory chemicals that are commercially available in this manner and format.* Complete update of this valuable, well-known reference* Provides purification procedures of commercially available chemicals and biochemicals* Includes an extremely useful compilation of ionisation constants |
| principles of plasma discharges and materials processing: Plasma Applications for Material Modification Francisco L. Tabarés, 2021-09-23 This book is an up-to-date review of the most important plasma-based techniques for material modification, from microelectronics to biological materials and from fusion plasmas to atmospheric ones. Each its technical chapters is written by long-experienced, internationally recognised researchers. The book provides a deep and comprehensive insight into plasma technology and its associated elemental processes and is illustrated throughout with excellent figures and references to complement each section. Although some of the topics covered can be traced back several decades, care has been taken to emphasize the most recent findings and expected evolution. The first time the word ‘plasma’ appeared in print in a scientific text related to the study of electrical discharges in gases was 1928, when Irving Langmuir published his article ‘Oscillations in Ionized Gases’. It was the baptism of the predominant state of matter in the known universe (it is estimated that up to 99% of matter is plasma), although not on earth, where the conditions of pressure and temperature make normal the states of matter (solid, liquid, gas) which, in global terms, are exotic. It is enough to add energy to a solid (in the form of heat or electromagnetic radiation) to go into the liquid state, from which gas is obtained through an additional supply of energy. If we continue adding energy to the gas, we will partially or totally ionise it and reach a new state of matter, plasma, made up of free electrons, atoms and molecules (electrically neutral particles) and ions (endowed with a positive or a negative electric charge). |
| principles of plasma discharges and materials processing: Encyclopedia of Plasma Technology - Two Volume Set J. Leon Shohet, 2016-12-12 Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) e-reference@taylorandfrancis.com International: (Tel) +44 (0) 20 7017 6062; (E-mail) online.sales@tandf.co.uk |
| principles of plasma discharges and materials processing: Plasma Science and Technology for Emerging Economies Rajdeep Singh Rawat, 2017-10-07 This book highlights plasma science and technology-related research and development work at institutes and universities networked through Asian African Association for Plasma Training (AAAPT) which was established in 1988. The AAAPT, with 52 member institutes in 24 countries, promotes the initiation and intensification of plasma research and development through cooperation and technology sharing. With 13 chapters on fusion-relevant, laboratory and industrial plasmas for wide range of applications and basic research and a chapter on AAAPT network, it demonstrates how, with collaborations, high-quality, industrially relevant academic and scientific research on fusion, industrial and laboratory plasmas and plasma diagnostics can be successfully pursued in small research labs. These plasma sciences and technologies include pioneering breakthroughs and applications in (i) fusion relevant research in the quest for long-term, clean energy source development using high-temperature, high- density plasmas and (ii) multibillion-dollar, low-temperature, non-equilibrium and thermal industrial plasmas used in processing, synthesis and electronics. |
| principles of plasma discharges and materials processing: Encyclopedia of Chemical Physics and Physical Chemistry John H. Moore, Nicholas D. Spencer, 2023-07-03 The Encyclopedia of Physical Chemistry and Chemical Physics introduces possibly unfamiliar areas, explains important experimental and computational techniques, and describes modern endeavors. The encyclopedia quickly provides the basics, defines the scope of each subdiscipline, and indicates where to go for a more complete and detailed explanation. Particular attention has been paid to symbols and abbreviations to make this a user-friendly encyclopedia. Care has been taken to ensure that the reading level is suitable for the trained chemist or physicist. The encyclopedia is divided in three major sections: FUNDAMENTALS: the mechanics of atoms and molecules and their interactions, the macroscopic and statistical description of systems at equilibrium, and the basic ways of treating reacting systems. The contributions in this section assume a somewhat less sophisticated audience than the two subsequent sections. At least a portion of each article inevitably covers material that might also be found in a modern, undergraduate physical chemistry text. METHODS: the instrumentation and fundamental theory employed in the major spectroscopic techniques, the experimental means for characterizing materials, the instrumentation and basic theory employed in the study of chemical kinetics, and the computational techniques used to predict the static and dynamic properties of materials. APPLICATIONS: specific topics of current interest and intensive research. For the practicing physicist or chemist, this encyclopedia is the place to start when confronted with a new problem or when the techniques of an unfamiliar area might be exploited. For a graduate student in chemistry or physics, the encyclopedia gives a synopsis of the basics and an overview of the range of activities in which physical principles are applied to chemical problems. It will lead any of these groups to the salient points of a new field as rapidly as possible and gives pointers as to where to read about the topic in more detail. |
| principles of plasma discharges and materials processing: Low Temperature Plasma Technology Paul K. Chu, XinPei Lu, 2013-07-15 Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students. |
| principles of plasma discharges and materials processing: Comprehensive Materials Processing , 2014-04-07 Comprehensive Materials Processing, Thirteen Volume Set provides students and professionals with a one-stop resource consolidating and enhancing the literature of the materials processing and manufacturing universe. It provides authoritative analysis of all processes, technologies, and techniques for converting industrial materials from a raw state into finished parts or products. Assisting scientists and engineers in the selection, design, and use of materials, whether in the lab or in industry, it matches the adaptive complexity of emergent materials and processing technologies. Extensive traditional article-level academic discussion of core theories and applications is supplemented by applied case studies and advanced multimedia features. Coverage encompasses the general categories of solidification, powder, deposition, and deformation processing, and includes discussion on plant and tool design, analysis and characterization of processing techniques, high-temperatures studies, and the influence of process scale on component characteristics and behavior. Authored and reviewed by world-class academic and industrial specialists in each subject field Practical tools such as integrated case studies, user-defined process schemata, and multimedia modeling and functionality Maximizes research efficiency by collating the most important and established information in one place with integrated applets linking to relevant outside sources |
| principles of plasma discharges and materials processing: Applications of Cold Plasma in Food Safety Tian Ding, P.J. Cullen, Wenjing Yan, 2021-11-08 This book provides readers with a comprehensive overview of cold plasma technology for tackling the various food-related hazards in a wide range of food sectors. The principles and characteristics of cold plasma generation in gas and its interaction with liquids, as well as its combating modes of action for common hazards (e.g., bacteria, spores, biofilms, fungi, and fungal toxins) are emphasized in this book. It also presents the applications of cold plasma or its hurdles with other techniques to assure the microbiological safety of the key food classifications, including fruits, vegetables, cereals, grains, meat, aquatic products, liquid food products (e.g., juices, milk), nuts, spices, herbs, and food packaging. This book is useful for researchers to grasp the comprehensive understandings of how food safety can be controlled with cold plasma technology. This book also provides adequate information for engineers in food industry for better development and optimization of the plasma-generating systems. Government institutions that are responsible for food safety regulations can understand more knowledge about the intricacies and influencing factors, which should be considered for regulating the applications of cold plasma technology in food. |
| principles of plasma discharges and materials processing: Encyclopedia of Interfacial Chemistry , 2018-03-29 Encyclopedia of Interfacial Chemistry: Surface Science and Electrochemistry, Seven Volume Set summarizes current, fundamental knowledge of interfacial chemistry, bringing readers the latest developments in the field. As the chemical and physical properties and processes at solid and liquid interfaces are the scientific basis of so many technologies which enhance our lives and create new opportunities, its important to highlight how these technologies enable the design and optimization of functional materials for heterogeneous and electro-catalysts in food production, pollution control, energy conversion and storage, medical applications requiring biocompatibility, drug delivery, and more. This book provides an interdisciplinary view that lies at the intersection of these fields. Presents fundamental knowledge of interfacial chemistry, surface science and electrochemistry and provides cutting-edge research from academics and practitioners across various fields and global regions |
| principles of plasma discharges and materials processing: Plasma Electronics Toshiaki Makabe, Zoran Lj. Petrovic, 2006-03-27 Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition, |
| principles of plasma discharges and materials processing: Plasma Charging Damage Kin P. Cheung, 2012-12-06 In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. A key factor that makes these advances possible is the ability to have precise control on material properties and physical dimensions. The introduction of plasma processing in pattern transfer and in thin film deposition is a critical enabling advance among other things. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps. Plasma is sometimes called the fourth state of matter (other than gas, liquid and solid). It is a mixture of ions (positive and negative), electrons and neutrals in a quasi-neutral gaseous steady state very far from equilibrium, sustained by an energy source that balances the loss of charged particles. It is a very harsh environment for the delicate ICs. Highly energetic particles such as ions, electrons and photons bombard the surface of the wafer continuously. These bombardments can cause all kinds of damage to the silicon devices that make up the integrated circuits. |
| principles of plasma discharges and materials processing: Ideal Magnetohydrodynamics Jeffrey P. Freidberg, 2013-11-20 |
| principles of plasma discharges and materials processing: Industrial Plasma Engineering J Reece Roth, 2017-11-01 Written by a leading expert in the field, the paperback edition of Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers. |
| principles of plasma discharges and materials processing: Plasma Catalysis Annemie Bogaerts, 2019-04-02 Plasma catalysis is gaining increasing interest for various gas conversion applications, such as CO2 conversion into value-added chemicals and fuels, N2 fixation for the synthesis of NH3 or NOx, methane conversion into higher hydrocarbons or oxygenates. It is also widely used for air pollution control (e.g., VOC remediation). Plasma catalysis allows thermodynamically difficult reactions to proceed at ambient pressure and temperature, due to activation of the gas molecules by energetic electrons created in the plasma. However, plasma is very reactive but not selective, and thus a catalyst is needed to improve the selectivity. In spite of the growing interest in plasma catalysis, the underlying mechanisms of the (possible) synergy between plasma and catalyst are not yet fully understood. Indeed, plasma catalysis is quite complicated, as the plasma will affect the catalyst and vice versa. Moreover, due to the reactive plasma environment, the most suitable catalysts will probably be different from thermal catalysts. More research is needed to better understand the plasma–catalyst interactions, in order to further improve the applications. |
| principles of plasma discharges and materials processing: Nonequilibrium Atmospheric Pressure Plasma Jets XinPei Lu, Stephan Reuter, Mounir Laroussi, DaWei Liu, 2019-04-23 Nonequilibrium atmospheric pressure plasma jets (N-APPJs) generate plasma in open space rather than in a confined chamber and can be utilized for applications in medicine. This book provides a complete introduction to this fast-emerging field, from the fundamental physics, to experimental approaches, to plasma and reactive species diagnostics. It provides an overview of the development of a wide range of plasma jet devices and their fundamental mechanisms. The book concludes with a discussion of the exciting application of plasmas for cancer treatment. The book provides details on experimental methods including expert tips and caveats. covers novel devices driven by various power sources and the impact of operating conditions on concentrations and fluxes of the reactive species. discusses the latest advances including theory, modeling, and simulation approaches. gives an introduction, overview and details on state of the art diagnostics of small scale high gradient atmospheric pressure plasmas. covers the use of N-APPJs for cancer applications, including discussion of destruction of cancer cells, mechanisms of action, and selectivity studies. XinPei Lu is a Chair Professor in the School of Electrical and Electronic Engineering at Huazhong University of Science and Technology. Stephan Reuter is currently Visiting Professor at Université Paris-Saclay. In a recent Alexander von Humboldt research fellowship at Princeton University, he performed ultrafast laser spectroscopy on cold plasmas. Mounir Laroussi is Professor of Electrical and Computer Engineering and director of the Plasma Engineering and Medicine Institute at Old Dominion University. He is a Fellow of IEEE and recipient of an IEEE Merit Award. DaWei Liu is Professor in the School of Electrical and Electronic Engineering at Huazhong University of Science and Technology. |
| principles of plasma discharges and materials processing: Plasma Technologies for Textiles Roshan Shishoo, 2007-02-21 Plasma technologies present an environmentally-friendly and versatile way of treating textile materials in order to enhance a variety of properties such as wettability, liquid repellency, dyeability and coating adhesion. Recent advances made in commercially viable plasma systems have greatly increased the potential of using plasma technology in industrial textile finishing. This pioneering book provides an essential guide to both the technology and science related to plasmas and its practical applications in the textile industry.The first part of the book discusses the science and technology behind plasmas. Chapters give detailed and comprehensive descriptions on the characteristics of plasmas and methods of control and treatment in the processing of textiles. Both low pressure cold plasma and atmospheric pressure cold plasma processes are described as well as the diagnosis and control of plasma parameters in plasma generating reactors. A chapter is devoted to the use of plasma technology to achieve nanoscale treatment of textile surfaces. The second part of the book concentrates on specific applications of plasma technologies. Chapters cover treatments for water and oil repellency of textiles, engineering of biomedical textiles and woollen finishing techniques through the use of plasma technologies. Further chapters cover the modification of fibres for use in composites and the potential use of plasma technologies for the finishing of fabrics made of man made fibres. The final chapter in the book gives a comprehensive analysis of the surface chemical and physical characterisation of plasma treated fabrics.Written by a distinguished international team of experts, Plasma technologies for textiles is an invaluable reference for researchers, scientists and technologists alike. - Summarises both the science and technology of plasma processing, and its practical applications - Discusses how plasma technology improves textile properties such as wettability and liquid repelling - An invaluable reference for researchers, scientists and technologists |
| principles of plasma discharges and materials processing: Pulsed Discharge Plasmas Tao Shao, Cheng Zhang, 2023-07-14 This book highlights the latest progress in pulsed discharge plasmas presented by front-line researchers worldwide. The science and technology surrounding pulsed discharge plasmas is advanced through a wide scope of interdisciplinary studies into pulsed power and plasma physics. Pulsed discharge plasmas with high-power density, high E/N and high-energy electrons can effectively generate highly reactive plasma. Related applications have gathered strong interests in various fields. With contributions from global scientists, the book elaborates on the theories, numerical simulations, diagnostic methods, discharge characteristics and application technologies of pulsed discharge plasmas. The book is divided into three parts with a total of 35 chapters, including 11 chapters on pulsed discharge generation and mechanism, 12 chapters on pulsed discharge characterization and 12 chapters on pulsed discharge applications (wastewater treatments, biomedicine, surface modification, and energy conversion, etc). The book is a must-have reference for researchers and engineers in related fields and graduate students interested in the subject. |
| principles of plasma discharges and materials processing: Electron Kinetics and Applications of Glow Discharges Uwe Kortshagen, Lev D. Tsendin, 2006-04-11 This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature. |
| principles of plasma discharges and materials processing: Biomaterials Fabrication and Processing Handbook Paul K. Chu, Xuanyong Liu, 2008-03-27 This volume focuses on a variety of production and processing aspects of the latest biomaterials. It discusses how scaffolds are used in tissue engineering and describes common implant materials, such as hard tissue, blood contacting, and soft tissue. The book also examines the important role nanotechnology plays in the preparation of drugs, protein delivery, tissue engineering, cardiovascular biomaterials, hard tissue replacements, biosensors, and bio-MEMS. With contributions from renowned international experts and extensive reference lists in each chapter, this book provides detailed, practical information to produce biomaterials and employ them in biomedicine. |
| principles of plasma discharges and materials processing: Encyclopedia of Iron, Steel, and Their Alloys (Online Version) Rafael Colás, George E. Totten, 2016-01-06 The first of many important works featured in CRC Press’ Metals and Alloys Encyclopedia Collection, the Encyclopedia of Iron, Steel, and Their Alloys covers all the fundamental, theoretical, and application-related aspects of the metallurgical science, engineering, and technology of iron, steel, and their alloys. This Five-Volume Set addresses topics such as extractive metallurgy, powder metallurgy and processing, physical metallurgy, production engineering, corrosion engineering, thermal processing, metalworking, welding, iron- and steelmaking, heat treating, rolling, casting, hot and cold forming, surface finishing and coating, crystallography, metallography, computational metallurgy, metal-matrix composites, intermetallics, nano- and micro-structured metals and alloys, nano- and micro-alloying effects, special steels, and mining. A valuable reference for materials scientists and engineers, chemists, manufacturers, miners, researchers, and students, this must-have encyclopedia: Provides extensive coverage of properties and recommended practices Includes a wealth of helpful charts, nomograms, and figures Contains cross referencing for quick and easy search Each entry is written by a subject-matter expert and reviewed by an international panel of renowned researchers from academia, government, and industry. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) e-reference@taylorandfrancis.com International: (Tel) +44 (0) 20 7017 6062; (E-mail) online.sales@tandf.co.uk |
| principles of plasma discharges and materials processing: Non-Equilibrium Air Plasmas at Atmospheric Pressure K.H. Becker, U. Kogelschatz, K.H. Schoenbach, R.J. Barker, 2004-11-29 Atmospheric-pressure plasmas continue to attract considerable research interest due to their diverse applications, including high power lasers, opening switches, novel plasma processing applications and sputtering, EM absorbers and reflectors, remediation of gaseous pollutants, excimer lamps, and other noncoherent light sources. Non-Equilibrium Air Plasmas at Atmospheric Pressure reviews recent advances and applications in the generation and maintenance of atmospheric-pressure plasmas. With contributions from leading international researchers, the coverage includes advances in atmospheric-pressure plasma source development, diagnostics and characterization, air plasma chemistry, modeling and computational techniques, and an assessment of the status and prospects of atmospheric-pressure air plasma applications. The extensive applications sections make this book attractive for practitioners in many fields where technologies based on atmospheric-pressure air plasmas are emerging. |
| principles of plasma discharges and materials processing: Low Temperature Plasma Technology Paul K. Chu, XinPei Lu, 2013-07-15 Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration i |
| principles of plasma discharges and materials processing: Recent Advances in Porous Ceramics Uday M. Basheer Al-Naib, 2018-09-19 Porous ceramics have recently gained growing importance in industry because of their many applications like filters, absorbers, dust collectors, thermal insulation, hot gas collectors, dielectric resonators, bioreactors, bone replacement and automobile engine components. Generally, porous ceramics have good properties such as mechanical strength, abrasion resistance, and chemical and thermal stability. These porous network ceramic structures also have relatively low density, low mass and low thermal conductivity. Furthermore, permeability is one of the most important properties of porous ceramics for different applications such as membranes because this property directly relates to the pressure drop during filtration. Pore size control is one key factor in fabrication of porous ceramics. The size of particles and their distribution of the raw materials, manufacturing techniques, types of binder used, distribution of binder, and sintering affect the final porosity and pore connectivity, are important things that must be considered during the manufacturing of a porous ceramic body. Therefore, the development of porous ceramic research requires sufficient mechanical and chemical stability as well as permeability. This book covers a wide range of topics such as porous ceramic structure and properties, preparation, simulation and fabrication, sintering, applications for bioceramics, sensors, magnetics and energy saving. |
| principles of plasma discharges and materials processing: Introduction to the Kinetics of Glow Discharges Chengxun Yuan, Anatoly A Kudryavtsev, Vladimir I Demidov, 2018-08-20 Electric glow discharges (glows) can be found almost everywhere, from atmospheric electricity to modern plasma technologies, and have long been the object of research. The main purpose of this book is to provide simple illustrations of the basic physical mechanisms and principles that determine the properties of electric glow discharges. It should enable readers to successfully participate in scientific and technical progress. |
| principles of plasma discharges and materials processing: Research Perspectives on Functional Micro- and Nanoscale Coatings Zuzuarregui, Ana, Morant-Miñana, Maria Carmen, 2016-04-11 Just as chemistry is a part of our daily lives, functional coatings can be found in almost every object, gadget or device you can see or touch. However, in the last 20 years the advances made in the preparation of different functional coatings with diverse compositions have allowed the development of nanoscale coatings that are more cost-effective and environmentally conscious than traditional coatings. Research Perspectives on Functional Micro- and Nanoscale Coatings highlights critical research on preparation methods, modification, organization, and utilization of functional coatings in micro, nano, and biotechnology. Emphasizing emerging developments and global research perspectives, this publication is a pivotal resource for engineers, researchers, and graduate-level students interested in learning about emerging developments in functional coatings and nanotechnology. |
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a comprehensive and fundamental law, doctrine, or assumption; a rule or code of conduct; habitual devotion to right principles… See the full definition
Principles by Ray Dalio
Ray Dalio, one of the world’s most successful investors and entrepreneurs, shares the unconventional principles that helped him create unique results in life and business.
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Principle definition: A basic truth, law, or assumption.
PRINCIPLE Definition & Meaning - Merriam-Webster
a comprehensive and fundamental law, doctrine, or assumption; a rule or code of conduct; habitual devotion to right principles… See the full definition
Principles by Ray Dalio
Ray Dalio, one of the world’s most successful investors and entrepreneurs, shares the unconventional principles that helped him create unique …
Principle - Definition, Meaning & Synonyms | Vocabulary.com
A principle is a kind of rule, belief, or idea that guides you. You can also say a good, ethical person has a lot of …
PRINCIPLE | English meaning - Cambridge Dictionary
Principal as an adjective means ‘most important’: … [ C ] His guiding principle is that everyone should have equal …
Principle - Wikipedia
There are many principles observed in physics, notably in cosmology which observes the mediocrity principle, the anthropic principle, the principle of …
